Manufacturer: Film Sensor
Applications:
+ Film Sense Multi-Wavelength ellipsometers excel at measuring the thickness and index of refraction of transparent single films
+ Multi-Wavelength Ellipsometry can also be used to measure multilayer film stacks (in some cases up to 5 layers), depending on the thicknesses and indices of refraction of the layers. Simulations can be performed in the Film Sense software to determine if a particular sample structure is possible. For some samples, surface roughness and index gradients in the film can also be characterized.
+ Film Sense Automated Mapping Systems are fast, easy to operate, and can characterize thickness uniformity on wafers up to 300 mm in diameter.
Technology:
Film Sense ellipsometers use polarized light to non-destructively characterize samples. In an ellipsometer system, the Source emits light with a known polarization, which is obliquely incident on the sample, and the Detector measures the polarization state of the light reflected from the sample.
Products
Multi-Wavelength Ellipsometer
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The 4th generation Film Sense Multi-Wavelength Ellipsometer systems are now available, with more wavelengths and wider spectral range! |
Automated Mapping Systems
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The FS-RT300 combines an FS-8 Multi-Wavelength Ellipsometer with a compact automated mapping stage to provide fast, accurate, and reliable film thickness uniformity measurements across a wafer. |
In Situ Monitoring |
Film Sense Multi-Wavelength Ellipsometers are ideal for in situ realtime monitoring and control of thin film deposition and etching processes. |