Công ty TNHH Atek Việt Nam

Công ty TNHH Atek Việt Nam

Công ty TNHH Atek Việt Nam

Multi-Wavelength Ellipsometers for Thin Film Measurements-Film Sensor

Origin:  US

Manufacturer: Film Sensor

Applications: 

+ Film Sense Multi-Wavelength ellipsometers excel at measuring the thickness and index of refraction of transparent single films

+ Multi-Wavelength Ellipsometry can also be used to measure multilayer film stacks (in some cases up to 5 layers), depending on the thicknesses and indices of refraction of the layers. Simulations can be performed in the Film Sense software to determine if a particular sample structure is possible. For some samples, surface roughness and index gradients in the film can also be characterized.

+ Film Sense Automated Mapping Systems are fast, easy to operate, and can characterize thickness uniformity on wafers up to 300 mm in diameter.

Technology: 

Film Sense ellipsometers use polarized light to non-destructively characterize samples.  In an ellipsometer system, the Source emits light with a known polarization, which is obliquely incident on the sample, and the Detector measures the polarization state of the light reflected from the sample.

About Film Sense

Our mission is to create compact and affordable multi-wavelength ellipsometer systems that provide optimal measurement solutions for a wide range of thin film metrology applications. 

Products

Multi-Wavelength Ellipsometer

 

The 4th generation Film Sense Multi-Wavelength Ellipsometer systems are now available, with more wavelengths and wider spectral range!

Automated Mapping Systems

 

The FS-RT300 combines an FS-8 Multi-Wavelength Ellipsometer with a compact automated mapping stage to provide fast, accurate, and reliable film thickness uniformity measurements across a wafer.

In Situ Monitoring

Film Sense Multi-Wavelength Ellipsometers are ideal for in situ realtime monitoring and control of thin film deposition and etching processes.

https://film-sense.com/film-sense-products/